Nobuaki Sugimura

Title: Innovations by Nobuaki Sugimura

Introduction

Nobuaki Sugimura is a notable inventor based in Haibara-gun, Japan. He has made significant contributions to the field of chemical solutions, particularly in the manufacturing and treatment processes. With a total of 9 patents to his name, Sugimura's work demonstrates a commitment to advancing technology in his area of expertise.

Latest Patents

Sugimura's latest patents include a chemical solution, a method for manufacturing the chemical solution, and a method for treating substrates. The chemical solution exhibits excellent etching performance for transition metal-containing substances and showcases remarkable defect inhibition performance. The solution comprises one or more kinds of periodic acids, selected from a group that includes periodic acids and their salts, along with one or more first metal components, such as titanium (Ti) and zirconium (Zr), and water. In cases where the solution contains a single first metal component, its content ranges from 1 ppt by mass to 100 ppm by mass relative to the total mass of the periodic acids. When two first metal components are included, their combined content is limited to 100 ppm by mass, with at least one component being present at a minimum of 1 ppt by mass.

Career Highlights

Sugimura is currently employed at Fujifilm Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the performance of chemical solutions used in various applications.

Collaborations

Some of his notable coworkers include Tomonori Takahashi and Hiroyuki Seki, who contribute to the collaborative efforts within the company.

Conclusion

Nobuaki Sugimura's contributions to the field of chemical solutions reflect his dedication to innovation and excellence. His patents not only advance the technology but also pave the way for future developments in the industry.