Company Filing History:
Years Active: 1991-1999
Title: The Innovations of Nobu Nakane
Introduction
Nobu Nakane is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of light-sensitive materials and exposure apparatuses. With a total of five patents to his name, Nakane's work has had a considerable impact on the industry.
Latest Patents
One of Nakane's latest patents is a scanning exposure apparatus. This innovative device allows a photographic light-sensitive material to be exposed to a light image of an original. It includes a light illuminating member for illuminating light to the original, an optical member for projecting the light onto an exposure position as a line image, and a material conveyor that conveys the material at a constant speed. Additionally, it features a moving member that moves the original at a definite speed while the line image is projected onto the material. A start position determining member is also included to determine the start position of the original based on the magnification or image density.
Another notable patent is a processing apparatus for light-sensitive material. This apparatus consists of multiple processing tanks for processing light-sensitive materials and a kit that accommodates solid processing agents for each tank. It also includes a replenishing device for these agents, a memory for tracking the amount used, and a detector for signaling when the agents need replacement.
Career Highlights
Nobu Nakane is currently employed at Konica Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of light-sensitive materials and processing techniques.
Collaborations
Throughout his career, Nakane has collaborated with notable colleagues such as Yutaka Ohsone and Tetsuya Kurimoto. Their combined expertise has contributed to the success of various projects and patents.
Conclusion
Nobu Nakane's contributions to the field of light-sensitive materials and exposure apparatuses highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving processing techniques and enhancing the capabilities of photographic materials.