Tokyo, Japan

Noboru Fujikawa


Average Co-Inventor Count = 4.8

ph-index = 5

Forward Citations = 67(Granted Patents)


Location History:

  • Tokyo, JA (1978)
  • Tokyo, JP (1980 - 1982)
  • Fuji, JP (1982)

Company Filing History:


Years Active: 1978-1982

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5 patents (USPTO):Explore Patents

Title: Noboru Fujikawa: Innovator in Photopolymer Technology

Introduction

Noboru Fujikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photopolymer technology, holding a total of 5 patents. His work focuses on developing innovative solutions that enhance the production processes in various industries.

Latest Patents

Fujikawa's latest patents include a photopolymerizable element that comprises a soluble or dispersible oriented film support. This invention allows for the production of polymeric images without the need for stripping the film support. Additionally, he has developed a photopolymerizable composition containing an s-triazine compound, which improves adhesion to substrates in aqueous plating or etching solutions.

Career Highlights

Fujikawa is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work has been instrumental in advancing photopolymer technology, particularly in applications related to printed circuit boards.

Collaborations

Throughout his career, Fujikawa has collaborated with notable colleagues, including Tadashi Taguchi and Mitsuo Kohno. These partnerships have fostered innovation and contributed to the success of his projects.

Conclusion

Noboru Fujikawa's contributions to photopolymer technology have established him as a key figure in his field. His innovative patents and collaborations continue to influence advancements in manufacturing processes.

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