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For the Inventor, By the Inventor

Tokyo, Japan

Noboru Fujikawa

This inventor holds 5 USPTO granted patents. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1978-1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noboru Fujikawa. Retrieved from https://idiyas.com/inventor/noboru-fujikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 5

Forward Citations = 67(Granted Patents)


Location History:

  • Tokyo, JA (1978)
  • Tokyo, JP (1980 - 1982)
  • Fuji, JP (1982)

Company Filing History:

goldMedal5 out of 1,297 
 
Asahi Kasei Kogyo Kabushiki Kaisha
 patents

Years Active: 1978-1982

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5 patents (USPTO):Explore Patents
1. 4360582 - Photopolymerizable element comprising a soluble or dispersible oriented (1982-11-23),
2. 4320189 - Photopolymerizable composition containing s-triazine compound (1982-03-16),
3. 4301230 - Oriented polystyrene support for photopolymerizable element (1981-11-17),
4. 4211560 - Process for producing image using laminated oriented cover film (1980-07-08),
5. 4075100 - Dialysis unit and dialysis apparatus employing the dialysis unit (1978-02-21),

Title: Noboru Fujikawa: Innovator in Photopolymer Technology

Introduction

Noboru Fujikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photopolymer technology, holding a total of 5 patents. His work focuses on developing innovative solutions that enhance the production processes in various industries.

Latest Patents

Fujikawa's latest patents include a photopolymerizable element that comprises a soluble or dispersible oriented film support. This invention allows for the production of polymeric images without the need for stripping the film support. Additionally, he has developed a photopolymerizable composition containing an s-triazine compound, which improves adhesion to substrates in aqueous plating or etching solutions.

Career Highlights

Fujikawa is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work has been instrumental in advancing photopolymer technology, particularly in applications related to printed circuit boards.

Collaborations

Throughout his career, Fujikawa has collaborated with notable colleagues, including Tadashi Taguchi and Mitsuo Kohno. These partnerships have fostered innovation and contributed to the success of his projects.

Conclusion

Noboru Fujikawa's contributions to photopolymer technology have established him as a key figure in his field. His innovative patents and collaborations continue to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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