Company Filing History:
Years Active: 2012
Title: Noashi Adachi: Innovator in Epitaxial Wafer Technology
Introduction
Noashi Adachi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of epitaxial wafers. With a total of two patents to his name, Adachi's work has had a notable impact on the industry.
Latest Patents
Adachi's latest patents focus on the production method of epitaxial wafers. One of his key innovations involves ion-implanting a small amount of oxygen into the surface layer of a wafer. Following this, heat treatment is applied to create an incomplete implanted oxide film in the surface layer. This method effectively reduces wafer costs, prevents the formation of pits on the surface of the epitaxial film, and avoids slips in the external peripheral portion of the wafer.
Career Highlights
Adachi is currently employed at Sumco Corporation, a leading company in the semiconductor industry. His work at Sumco has allowed him to further develop his expertise in wafer technology and contribute to advancements in the field.
Collaborations
Throughout his career, Adachi has collaborated with notable colleagues, including Yoshiro Aoki and Akihiko Endo. These collaborations have fostered innovation and have been instrumental in the development of new technologies.
Conclusion
Noashi Adachi's contributions to epitaxial wafer technology demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the challenges in wafer production and offer solutions that enhance efficiency and reduce costs.