Columbus, OH, United States of America

Noah Mun

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Noah Mun in Integrated Circuit Assessment

Introduction

Noah Mun is an accomplished inventor based in Columbus, OH (US). He has made significant contributions to the field of integrated circuit (IC) assessment, holding two patents that showcase his innovative approach to technology. His work primarily focuses on the application of artificial intelligence in enhancing the accuracy and efficiency of IC evaluations.

Latest Patents

Noah Mun's latest patents include a groundbreaking method for fabricated layout correlation. This method involves training an artificial intelligence (AI) component, which comprises at least one artificial neural network (ANN), to transform layout rendering tiles of a reference IC into corresponding reference layout image tiles. These tiles are extracted from at least one layout image of the reference IC. By utilizing the trained AI component, standard cell layout renderings from a library of GDSII or OASIS standard cell layout renderings are transformed into as-fabricated standard cell layout renderings. This process results in a library of as-fabricated standard cell layout renderings. The method also identifies instantiated standard cells and their placements in the layout image of an IC-under-test by matching them with corresponding as-fabricated standard cell layout renderings retrieved from the library.

Career Highlights

Noah Mun is currently employed at Battelle Memorial Institute, where he continues to develop innovative solutions in the field of integrated circuits. His work has garnered attention for its potential to revolutionize IC assessment methods through the integration of AI technologies.

Collaborations

Noah collaborates with talented individuals such as Adam G Kimura and Rohan Prabhu, who contribute to the innovative environment at Battelle Memorial Institute. Their combined expertise fosters a culture of creativity and advancement in technology.

Conclusion

Noah Mun's contributions to integrated circuit assessment through his innovative patents highlight the importance of artificial intelligence in modern technology. His work at Battelle Memorial Institute and collaborations with skilled coworkers further enhance the impact of his inventions in the field.

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