Company Filing History:
Years Active: 2020-2022
Title: Innovations of Nishanth Manjunath in Atomic Layer Deposition
Introduction
Nishanth Manjunath is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of 2 patents, his work focuses on enhancing the precision and efficiency of film thickness matching in semiconductor manufacturing.
Latest Patents
Nishanth's latest patents include innovative methods and apparatuses for performing atomic layer deposition. One of his notable inventions is a method for thickness compensation by modulation of the number of deposition cycles as a function of chamber accumulation for wafer-to-wafer film thickness matching. This method involves determining the amount of accumulated deposition material in the interior region of a deposition chamber. It applies this information to calculate a compensated number of ALD cycles needed to achieve a target deposition thickness. This advancement allows for improved consistency in the manufacturing process of semiconductor devices.
Career Highlights
Nishanth Manjunath is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced deposition technologies. His contributions have been instrumental in pushing the boundaries of what is possible in semiconductor manufacturing.
Collaborations
Nishanth collaborates with talented individuals such as Richard Phillips and Chloe Baldasseroni. Their teamwork fosters an environment of innovation and creativity, leading to groundbreaking advancements in their field.
Conclusion
Nishanth Manjunath's work in atomic layer deposition exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions continue to influence the future of manufacturing technologies.