Company Filing History:
Years Active: 1977
Title: Nils Laegreid: Innovator in Plasma Sputtering Technology
Introduction
Nils Laegreid is a notable inventor based in Richland, WA (US). He has made significant contributions to the field of plasma sputtering technology. His innovative work has led to the development of a unique apparatus that enhances deposition rates in various applications.
Latest Patents
Laegreid holds a patent for a "Supported Plasma Sputtering Apparatus for High Deposition Rate." This invention describes a supported plasma sputtering apparatus that features shaped electrical fields in the electron discharge region between the cathode and anode. The apparatus is designed to achieve a high deposition rate that is substantially uniform over a wide area. The plasma shaping electrodes, which are separate from the anode and target, help create a high-density plasma. The anode surrounds the target, ensuring uniform sputtering across a large target area. Various embodiments of the invention utilize different anodes to shield from sputtered material or to maintain stable operation.
Career Highlights
Nils Laegreid is associated with the Battelle Memorial Institute, where he has been able to apply his expertise in plasma technology. His work has been instrumental in advancing the capabilities of sputtering apparatuses, which are crucial in various industrial applications.
Collaborations
Laegreid has collaborated with notable colleagues, including Ronald W. Moss and Edwin D. McClanahan. These collaborations have contributed to the development and refinement of his innovative technologies.
Conclusion
Nils Laegreid's contributions to plasma sputtering technology exemplify the impact of innovation in engineering. His patent and work at Battelle Memorial Institute highlight the importance of advancements in this field.