Amsterdam, Netherlands

Nils Gustav Martin Olsson Karlberg


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nils Gustav Martin Olsson Karlberg: Innovator in Adhesive Technology

Introduction

Nils Gustav Martin Olsson Karlberg is a notable inventor based in Amsterdam, Netherlands. He has made significant contributions to the field of adhesive technology, particularly through his innovative patent related to polyurethane-urea compositions.

Latest Patents

Karlberg holds a patent for an "Alkoxysilane functional polyurethane-urea for adhesive or coating." This invention pertains to a unique polyurethane-urea that can be utilized in the preparation of adhesive or coating compositions. The polyurethane-urea is synthesized through the polymerization of specific reaction components, including an alkoxysilane functional thioether diol, a polyisocyanate, and an alkoxysilane functional aspartate ester. This innovative material boasts low viscosity and is suitable for use in solvent- and water-free adhesives or coatings. It can be applied to a variety of substrates, including wood, metal, plastics, paper, stone, glass, and concrete.

Career Highlights

Karlberg is currently associated with Akzo Nobel Coatings International B.V., a leading company in the coatings industry. His work focuses on developing advanced adhesive solutions that meet the demands of modern applications.

Collaborations

Throughout his career, Karlberg has collaborated with esteemed colleagues such as Peter Andreas Plikk and Keimpe Jan Van Den Berg. These partnerships have contributed to the advancement of adhesive technologies and the successful implementation of innovative solutions in the industry.

Conclusion

Nils Gustav Martin Olsson Karlberg is a prominent figure in the field of adhesive technology, with a patent that showcases his expertise and innovative spirit. His contributions continue to influence the development of effective adhesive solutions in various applications.

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