Company Filing History:
Years Active: 2025
Title: Nikhil Dhawan: Innovator in Nanoparticle Technology
Introduction
Nikhil Dhawan is a prominent inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of nanoparticle technology, particularly in the development of sulfur- or heavy atom-containing nanoparticles. His innovative work has implications for various applications, including imaging and photodynamic therapy.
Latest Patents
Nikhil Dhawan holds 1 patent for his invention titled "Sulfur- or heavy atom-containing nanoparticles, methods of making same, and uses thereof." This patent describes the creation of silica or aluminosilica nanoparticles that contain sulfur or heavy atoms. These nanoparticles can have at least one dye molecule covalently bonded to their matrix, with a size of less than 10 nm. The applications of these nanoparticles include advanced imaging methods that provide sub-diffraction limit resolution and techniques for photodynamic therapy.
Career Highlights
Nikhil Dhawan is affiliated with Cornell University, where he continues to advance research in nanoparticle technology. His work is characterized by a commitment to innovation and the practical application of scientific discoveries.
Collaborations
Nikhil has collaborated with notable colleagues, including Ferdinand Fe Kohle and Joshua A Hinckley. These partnerships have contributed to the development and refinement of his research projects.
Conclusion
Nikhil Dhawan is a key figure in the field of nanoparticle technology, with a focus on creating advanced materials for medical applications. His contributions are paving the way for future innovations in imaging and therapy.