Bothell, WA, United States of America

Nicholas W Rohring


Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2013-2018

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2 patents (USPTO):

Title: Innovations by Nicholas W Rohring

Introduction

Nicholas W Rohring is an accomplished inventor based in Bothell, WA (US). He has made significant contributions to the field of digital image processing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents focuses on altering the appearance of a digital image using a shape. This technology describes a mask edit mode of operation where an application program displays a mask shape superimposed on a digital image. The application program provides user interface controls for altering the size, position, and rotation of the digital image independently of the mask shape. Additionally, it allows for the same adjustments to be made to the mask shape independently of the digital image. When a cropping request is received, the portion of the digital image within the mask shape is mapped onto the mask shape, creating a mask-cropped shape. The process then transitions into a normal editing mode, where user interface controls are available for modifying the size, position, and rotation of the mask-cropped shape.

Career Highlights

Nicholas W Rohring is currently associated with Microsoft Technology Licensing, LLC, where he continues to develop and refine his innovative ideas. His work has contributed to advancements in digital imaging technologies, enhancing user experience and functionality.

Collaborations

Throughout his career, Nicholas has collaborated with notable colleagues, including Larry T Hatfield and Scott Harrison Douglas. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

Nicholas W Rohring's contributions to digital image processing through his patents reflect his innovative spirit and dedication to technology. His work continues to influence the field and inspire future advancements.

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