Company Filing History:
Years Active: 2006-2009
Title: Innovations by Nicholas Pornsin-Sirirak
Introduction
Nicholas Pornsin-Sirirak is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of plasma etching technology. With a total of 2 patents, his work focuses on creating efficient methods for manufacturing silicon-containing structures.
Latest Patents
Nicholas's latest patents include a "Silicon-containing structure with deep etched features, and method of manufacture." This patent describes an uncomplicated method of plasma etching deeply recessed features, such as deep trenches, of at least 5 µm in depth in a silicon-containing substrate. The method generates smooth sidewalls with a roughness of less than about 1 µm, typically between about 100 nm and 20 nm. The sidewall taper angle relative to the underlying substrate typically ranges from about 85° to about 92°. In one embodiment, a stabilizing etchant species is used constantly during the plasma etch process, while at least one other etchant species and at least one polymer depositing species are applied intermittently.
Another patent is titled "Method of plasma etching a deeply recessed feature in a substrate using a plasma source gas modulated etchant system." This patent also focuses on the plasma etching of deeply recessed features in a silicon-containing substrate, ensuring the production of smooth sidewalls. The same principles of using stabilizing etchant species and intermittent application of other etchant and polymer depositing species are applied.
Career Highlights
Nicholas works at Applied Materials, Inc., a leading company in the field of materials engineering. His innovative methods have contributed to advancements in semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include Jeffrey D. Chinn and Michael Rattner, who have collaborated with him on various projects.
Conclusion
Nicholas Pornsin-Sirirak's contributions to plasma etching technology have paved the way for advancements in semiconductor manufacturing. His innovative methods and patents reflect his expertise and commitment to the field.