Company Filing History:
Years Active: 2012-2013
Title: Neville Slack: Innovator in Catalysis
Introduction
Neville Slack is a notable inventor based in Cleveland, GB. He has made significant contributions to the field of catalysis, holding a total of 2 patents. His work focuses on developing innovative catalyst compositions that enhance various chemical processes.
Latest Patents
Neville's latest patents include a catalyst composition that comprises the reaction product of an alkoxide or condensed alkoxide of a metal M, selected from titanium, zirconium, hafnium, aluminum, or a lanthanide. This composition also includes an alcohol containing at least two hydroxyl groups, a 2-hydroxy carboxylic acid, and a base. The molar ratio of base to 2-hydroxy carboxylic acid is in the range of 0.01-0.79:1. This catalyst is particularly useful for esterification reactions, especially in the production of polyesters such as polyethylene terephthalate, polytrimethylene terephthalate, and polybutylene terephthalate. Another patent details a similar catalyst composition, where the ratio of equivalents of base to —COOH acid equivalents of the 2-hydroxy carboxylic acid is in the range of 0.0033-0.2:1. This composition also serves as a catalyst for esterification reactions, further emphasizing Neville's expertise in this area.
Career Highlights
Neville Slack is currently associated with Dorf Ketal Chemicals (India) Pvt. Ltd., where he continues to innovate and develop new chemical processes. His work has been instrumental in advancing the field of catalysis, particularly in the production of essential polyesters.
Collaborations
Neville has collaborated with notable coworkers such as Charles Mark Lindall and Martin Graham Partridge. Their combined expertise has contributed to the successful development of innovative chemical solutions.
Conclusion
Neville Slack is a distinguished inventor whose work in catalysis has led to significant advancements in chemical processes. His patents reflect a commitment to innovation and excellence in the field.