Munich, Germany

Natividad Lopez Lavernia

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013-2019

Loading Chart...
Loading Chart...
5 patents (USPTO):Explore Patents

Title: Natividad Lopez Lavernia: Innovator in Diffusion Layer Technology

Introduction

Natividad Lopez Lavernia is a prominent inventor based in Munich, Germany. She has made significant contributions to the field of materials science, particularly in the development of diffusion layers for temperature-stressed components.

Latest Patents

Natividad holds 5 patents that showcase her innovative work. Her latest patents include a slip and process for producing an oxidation- and corrosion-resistant diffusion layer. This invention focuses on protecting components, especially in turbomachines, from oxidation and corrosion through a specialized application process. Another notable patent is for producing an aluminum diffusion layer, which involves a unique slip that combines Al-containing and Si-containing powders, enhancing the durability of the components.

Career Highlights

Throughout her career, Natividad has worked with notable companies such as MTU Aero Engines AG and MTU Aero Engines GmbH. Her expertise in materials engineering has been instrumental in advancing technologies that improve the performance and longevity of critical components in aerospace applications.

Collaborations

Natividad has collaborated with esteemed colleagues, including Max Niegl and Horst Pillhoefer. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Natividad Lopez Lavernia's contributions to the field of diffusion layer technology highlight her role as a leading inventor. Her patents reflect her commitment to advancing materials science and improving the performance of aerospace components.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…