Company Filing History:
Years Active: 2014-2019
Title: Nathan Bohannon: An Innovative Force in Chemical Mechanical Polishing
Introduction
Nathan Bohannon, an accomplished inventor based in Saratoga, California, has made significant contributions to the field of chemical mechanical polishing. With a portfolio of three patents, Bohannon's work showcases his expertise and innovative solutions in substrate processing, enhancing the efficiency and effectiveness of polishing systems.
Latest Patents
One of Bohannon's latest patents focuses on the "Selection of polishing parameters to generate removal or pressure profile." This innovation involves selecting values for multiple controllable parameters in a chemical mechanical polishing system. The system includes a carrier head with several zones capable of applying independently controllable pressures on a substrate. The patent details how data is stored, relating the variation in removal profiles on the substrate's front surface to the controllable parameters. By determining values for each parameter, the invention aims to minimize the difference between a target removal profile and an expected removal profile. This process significantly enhances the precision of polishing operations.
Career Highlights
Nathan Bohannon is currently associated with Applied Materials, Inc., a leading company in materials engineering. His role involves leveraging his innovative mindset to advance technologies related to semiconductor fabrication and materials processing. Bohannon's contributions are pivotal in refining processes that ensure high-quality output in various applications, making him a respected figure in his field.
Collaborations
In his career, Bohannon has worked alongside talented individuals such as Huanbo Zhang and Garrett Ho Yee Sin. Their collaborations have played a crucial role in driving advancements within Applied Materials, Inc., as they pool their expertise to solve complex challenges in chemical mechanical polishing technologies.
Conclusion
Nathan Bohannon exemplifies the spirit of innovation in the realms of substrate processing and polishing technologies. With his ongoing work and patented inventions, he continues to contribute to the evolution of the industry, making significant strides that enhance the performance of polishing systems. His dedication to improving manufacturing processes sets a benchmark for future inventors and engineers in the field.