Company Filing History:
2 out of 348 
1 out of 877 Years Active: 2015-2018
Title: Nathalie C D Bouet: Innovator in X-ray Technologies and Etching Processes
Introduction
Nathalie C D Bouet is a prominent inventor based in Wading River, NY (US). He has made significant contributions to the fields of X-ray technology and material etching, holding a total of 2 patents. His innovative work has implications for various scientific and industrial applications.
Latest Patents
Nathalie's latest patents include an X-ray filter for X-ray powder diffraction. This technology describes apparatus, methods, and systems effective for filtering X-rays. The filters consist of a first plate that includes an X-ray absorbing material and walls defining first slits with arc-shaped openings. These walls are designed to absorb some of the first X-rays and output second X-rays. Additionally, the filters comprise a second plate spaced from the first, which also includes X-ray absorbing material and walls defining second slits. This innovative design enhances the efficiency of X-ray filtering processes.
Another notable patent involves a technique for etching monolayer and multilayer materials. This process utilizes Reactive Ion Etching (RIE) with fluorine-based chemistry to achieve high ion energy, increasing the etching rate for deeper anisotropic etching. The method also includes a second embodiment that combines RIE with Inductively Coupled Plasma (ICP) using a mix of fluorine-based and chlorine-based chemistries. This approach allows for a high level of vertical anisotropy, which is crucial for advanced material processing.
Career Highlights
Throughout his career, Nathalie has worked with esteemed organizations such as Brookhaven Science Associates, LLC and UChicago Argonne, LLC. His experience in these institutions has allowed him to develop and refine his innovative technologies.
Collaborations
Nathalie has collaborated with notable colleagues, including Raymond P Conley and Ralu Divan. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Nathalie C D Bouet is a distinguished inventor whose work in X-ray technologies and etching processes has made a significant impact in the field. His patents reflect his commitment to innovation and excellence in scientific research.