Yokkaichi, Japan

Naruyasu Ishibashi



Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 61(Granted Patents)


Location History:

  • Mie-ken, JP (2000)
  • Yokkaichi, JP (2003 - 2009)
  • Yokkaichi-shi, JP (2009)

Company Filing History:


Years Active: 2000-2009

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7 patents (USPTO):Explore Patents

Title: Naruyasu Ishibashi: Innovator in Silicon Dioxide Technology

Introduction

Naruyasu Ishibashi is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of silicon dioxide technology, holding a total of 7 patents. His work focuses on the production and application of pyrogenically produced silicon dioxide powders.

Latest Patents

Ishibashi's latest patents include innovative methods for producing pyrogenically produced silicon dioxide powder and its dispersions. One notable patent describes a silicon dioxide powder characterized by aggregates of primary particles with a BET surface area of 90±15 m²/g. The aggregates have an average surface area ranging from 10,000 to 20,000 nm, with an average equivalent circle diameter (ECD) of 90 to 130 nm. This powder is produced through a pyrogenic process involving silicon tetrachloride and various silicon components, achieving an adiabatic flame temperature of 1810 to 1890°C. Another significant patent focuses on a highly dispersible fine hydrophobic silica powder, which boasts a hydrophobicity of over 50% and a triboelectrostatic charge exceeding -500 µC/g. This powder is created by mixing a volatile organic silicon compound with fine silica powder in a fluidized bed reaction vessel.

Career Highlights

Throughout his career, Naruyasu Ishibashi has worked with notable companies such as Nippon Aerosil Co., Ltd. and Degussa Aktiengesellschaft. His expertise in silicon dioxide technology has positioned him as a key figure in the industry.

Collaborations

Ishibashi has collaborated with esteemed colleagues, including Takeyoshi Shibasaki and Eiji Komai. These partnerships have contributed to the advancement of his innovative work in silicon dioxide production.

Conclusion

Naruyasu Ishibashi's contributions to silicon dioxide technology through his patents and collaborations highlight his role as a leading inventor in this field. His innovative approaches continue to influence the industry and pave the way for future advancements.

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