Company Filing History:
Years Active: 1996
Title: Naoko Miura: Innovator in Thin Film Technology
Introduction
Naoko Miura is a prominent inventor based in Kokubunji, Japan. She has made significant contributions to the field of thin film technology, particularly through her innovative patent. Miura's work exemplifies the intersection of creativity and technical expertise in the realm of material science.
Latest Patents
Naoko Miura holds a patent for a "Method for forming a pattern and forming a thin film used in pattern." This invention involves a sophisticated process where a seed material film is first created on a substrate. The film is then exposed using electron beam lithography to shape the desired pattern. Following this, the latent image is removed, and an oriented material is deposited on the seed material and substrate, which possess different hydrophilicity properties. The oriented film is formed using a Langmuir-Blodgett (LB) film forming method, with one example utilizing a cresol novolak resin that has a specific ratio of p-cresol novolak to m-cresol novolak of at least 20%. This patent highlights Miura's innovative approach to material application and pattern formation.
Career Highlights
Throughout her career, Naoko Miura has been associated with Hitachi, Ltd., a leading company in technology and innovation. Her work at Hitachi has allowed her to explore and develop advanced techniques in thin film technology, contributing to the company's reputation for excellence in research and development.
Collaborations
Naoko Miura has collaborated with notable colleagues, including Toshiyuki Yoshimura and Shinji Okazaki. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.
Conclusion
Naoko Miura's contributions to thin film technology through her innovative patent demonstrate her expertise and commitment to advancing material science. Her work continues to inspire future innovations in the industry.