Naoki Kawaura

Title: Naoki Kawaura: Innovator in Photomask Technology

Introduction

Naoki Kawaura is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of photomask technology, which is essential in the semiconductor manufacturing process. His innovative work has led to the development of a unique photomask blank that enhances the efficiency of photomask production.

Latest Patents

Kawaura holds a patent for a photomask blank, a photomask blank making method, and a photomask making method. The patent describes a photomask blank that comprises a transparent substrate, a first film of chromium-containing material on the substrate, and a second film of silicon/oxygen-containing material contiguous to the first film. Notably, the second film includes a first layer contiguous to the first film and a second layer spaced apart from the first layer in the film thickness direction. The oxygen content of the first layer is lower than that of the second layer. This innovative setting prevents an etching rate from ramping up at the interface between the first and second films during the etching of the first film.

Career Highlights

Kawaura is associated with Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work at the company has been instrumental in advancing photomask technology, which is crucial for the production of integrated circuits. His patent reflects his expertise and commitment to innovation in this specialized field.

Collaborations

Kawaura has collaborated with notable colleagues, including Takuro Kosaka and Hideo Kaneko. Their combined efforts have contributed to the development of advanced technologies in the semiconductor industry.

Conclusion

Naoki Kawaura's contributions to photomask technology exemplify the importance of innovation in the semiconductor manufacturing process. His patent and work at Shin-Etsu Chemical Co., Ltd. highlight his role as a key inventor in this critical field.