Company Filing History:
Years Active: 2002
Title: Nalin Rupasinghe: Innovator in Electron Emission Technology
Introduction
Nalin Rupasinghe is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of electron emission technology. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.
Latest Patents
Nalin Rupasinghe holds a patent for an "Electron emission film and field emission cold cathode device." This invention features an electron emission film that includes a matrix primarily composed of amorphous carbon and fullerene-like structures. These structures consist of a two-dimensional network of six-membered carbon rings. The fullerene-like structures are dispersed within the matrix and partially project from it. The weight ratio of amorphous carbon to the fullerene-like structures ranges from about 50:50 to 5:95. Additionally, the amorphous carbon contains nitrogen, which acts as a donor at a concentration of approximately 4×10 to 10 atom %.
Career Highlights
Nalin Rupasinghe is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to explore and develop advanced technologies in the field of electron emission.
Collaborations
Nalin has collaborated with esteemed colleagues such as Tadashi Sakai and Kazuya Nakayama. These partnerships have contributed to the advancement of his research and the successful development of his patent.
Conclusion
Nalin Rupasinghe is a distinguished inventor whose work in electron emission technology has made a significant impact. His innovative patent reflects his dedication to advancing technology in this field.