Penfield, NY, United States of America

Nair Mridula


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nair Mridula: Innovator in Coating Technologies

Introduction

Nair Mridula is a prominent inventor based in Penfield, NY (US). She has made significant contributions to the field of coating technologies, particularly with her innovative patent that addresses controlled absorption and scattering of electromagnetic radiation. Her work is vital in various applications, enhancing the functionality of materials used in different industries.

Latest Patents

Nair Mridula holds a patent for a coating that provides controlled absorption and scattering. This invention includes a substrate with a surface, a coating disposed over the surface, and a subtractive colorant that absorbs electromagnetic radiation according to a specified absorption spectrum. The coating comprises a binder material and a plurality of porous polymer particles with pores that are designed to scatter electromagnetic radiation in specified wavelength bands. Notably, the porous polymer particles have a shell that is impermeable to liquids, making this invention particularly useful in various applications.

Career Highlights

Nair Mridula is associated with Eastman Kodak Company, where she has been able to apply her expertise in coating technologies. Her role at the company has allowed her to work on innovative projects that push the boundaries of material science. With her patent, she has established herself as a key player in the field, contributing to advancements that benefit both the company and the industry.

Collaborations

Throughout her career, Nair has collaborated with notable colleagues, including Kevin D Lofftus and Sreekumar Cumar. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in coating applications.

Conclusion

Nair Mridula's contributions to coating technologies through her innovative patent demonstrate her expertise and commitment to advancing material science. Her work at Eastman Kodak Company and collaborations with esteemed colleagues highlight her significant impact in the field.

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