Company Filing History:
2 out of 5 
1 out of 832,880 Years Active: 1995-2001
Title: N William Parker: Innovator in Electron Beam Lithography and Plasma Processing
Introduction
N William Parker is a notable inventor based in Fairfield, CA (US). He has made significant contributions to the fields of electron beam lithography and plasma processing, holding a total of 3 patents. His innovative approaches have advanced the technology used in various applications, particularly in semiconductor manufacturing.
Latest Patents
One of Parker's latest patents is the "Proximity effect correction method through uniform removal of fraction of interior pixels." This method addresses the challenges of electron beam lithography by modifying exposure patterns. The technique involves subdividing shapes into edge and interior pixels, allowing for the uniform removal of a fraction of the interior pixels. This correction reduces the backscattered electron background dose, enhancing contrast for fine features, especially when they are in close proximity to larger shapes.
Another significant patent is the "High density plasma deposition and etching apparatus." This invention features a plasma source positioned above a substrate process chamber, utilizing a sapphire or alumina source tube for fluorine-containing plasmas. The apparatus is designed with inner and outer magnetic coils that shape the magnetic field within the process chamber. This design ensures uniform processing, particularly when using a unique diamond-shaped pattern of gas feed lines.
Career Highlights
Throughout his career, N William Parker has worked with Plasma & Materials Technologies, Inc., where he applied his expertise in plasma processing technologies. His work has contributed to advancements in the efficiency and effectiveness of plasma deposition and etching processes.
Collaborations
Parker has collaborated with notable professionals in his field, including Gregor A Campbell and Robert W Conn. These collaborations have fostered innovation and the sharing of ideas, further enhancing the impact of his work.
Conclusion
N William Parker's contributions to electron beam lithography and plasma processing demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of the complexities involved in these fields, paving the way for future advancements.