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Title: Myung-shik Chang: Innovator in Extreme Ultraviolet Lithography
Introduction
Myung-shik Chang is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, particularly through his innovative patents. With a total of 2 patents, Chang's work has garnered attention in the technology and semiconductor industries.
Latest Patents
Chang's latest patents focus on a pellicle film that includes a graphite-containing thin film specifically designed for extreme ultraviolet lithography. This pellicle film is crucial for enhancing the performance and reliability of EUV lithography processes, which are essential in the production of advanced semiconductor devices.
Career Highlights
Throughout his career, Myung-shik Chang has worked with notable organizations, including Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these prestigious institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in lithography technology.
Collaborations
Chang has collaborated with esteemed colleagues such as Mun Ja Kim and Ji-Beom Yoo. These partnerships have facilitated the exchange of ideas and expertise, further enhancing the impact of his work in the field.
Conclusion
Myung-shik Chang's contributions to extreme ultraviolet lithography through his innovative patents highlight his role as a key inventor in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.