Company Filing History:
Years Active: 1994-2000
Title: The Innovations of Muneyasu Yokota: Pioneering Advances in Exposure Technology
Introduction
Muneyasu Yokota, an esteemed inventor based in Tokyo, JP, has made significant contributions to the field of photolithography through his innovative technologies and patents. With a total of five patents to his name, Yokota has played a crucial role in advancing the capabilities of exposure apparatus and methods used in semiconductor manufacturing.
Latest Patents
Yokota's most recent patents showcase his expertise in exposure apparatus technology. One notable patent focuses on an exposure apparatus and method that enhances the accuracy of alignment during the photolithography process. The system utilizes detection of alignment marks on a substrate, calculating the stretching degrees in two orthogonal axial directions. By weighing these degrees and refining the magnification correction value, the apparatus effectively improves pattern continuity and overlay accuracy when substrate stretching occurs.
Another significant patent involves a scanning exposure apparatus, designed to illuminate a mask and project its image onto a photosensitive substrate. This invention incorporates a position detector that ensures precise alignment between the mask and substrate, while the memory and position correcting device work together to maintain this alignment during exposure, thus optimizing the entire process.
Career Highlights
Muneyasu Yokota's career has been marked by his tenure at Nikon Corporation, a leading company in the field of imaging and optical technology. His contributions have significantly enhanced the capabilities of Nikon’s exposure systems, allowing for greater precision and efficiency in semiconductor manufacturing processes.
Collaborations
Throughout his career, Yokota has collaborated with several notable peers, including Atsuyuki Aoki and Kei Nara. Together, they have worked on advancing the technologies within Nikon Corporation, ensuring that the company remains at the forefront of innovation in the industry.
Conclusion
Muneyasu Yokota's dedication to innovation and excellence in exposure technology is evident through his patents and collaborations within Nikon Corporation. His work not only enhances the manufacturing processes in the semiconductor industry but also demonstrates the impact of skilled inventors on modern technology. With each advancement, Yokota continues to pave the way for future innovations in photolithography and beyond.