Mukesh K Desai

Title: Mukesh K Desai: Innovator in Semiconductor Technology

Introduction

Mukesh K Desai is a prominent inventor based in Fishkill, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative work focuses on improving semiconductor chip reclamation techniques and enhancing electroerosion recording media.

Latest Patents

One of Mukesh's latest patents is a semiconductor chip reclamation technique involving multiple processes. This method allows for the removal of conductive metals on a semiconductor chip while preserving the integrity of the underlying foundation. The foundation consists of a dielectric layer and a connecting stud, which is crucial for maintaining functionality. The first planarization process effectively attacks the conductive metal at a high rate, while the second planarization process ensures that the connecting stud remains largely unaffected. Additionally, he has developed improved electroerosion printing plates that utilize a polyvinylbutyral polymer cross-linked with a phenol-formaldehyde agent. This formulation enhances adhesion and allows for increased thickness of the aluminum layer, resulting in superior optical density.

Career Highlights

Mukesh K Desai is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor processes.

Collaborations

Some of Mukesh's notable coworkers include Keith S Pennington and Ali Afzali-Ardakani. Their collaborative efforts have further propelled advancements in the projects they undertake together.

Conclusion

Mukesh K Desai's contributions to semiconductor technology and electroerosion media exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving existing technologies and creating new solutions.