Company Filing History:
Years Active: 2004
Title: Morio Terakado: Innovator in Photomask Technology
Introduction
Morio Terakado is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of photomask technology, particularly with his innovative approach to attaching pellicles to photomasks. His work is essential in the semiconductor manufacturing process, where precision and reliability are paramount.
Latest Patents
Morio Terakado holds a patent for a "Structure for attaching a pellicle to a photo-mask." This invention involves a pellicle frame and a pellicle sheet that is attached to an opening portion in the frame. Notably, a portion of the pellicle frame surface that contacts the photo-mask does so directly, without the use of adhesive. This innovation enhances the efficiency and effectiveness of photomask applications.
Career Highlights
Terakado is associated with Asahi Glass Company, Limited, where he has been able to apply his expertise in materials science and engineering. His work at the company has allowed him to focus on developing advanced technologies that support the semiconductor industry.
Collaborations
Throughout his career, Morio Terakado has collaborated with talented individuals such as Hitoshi Mishiro and Shinya Kikugawa. These collaborations have fostered an environment of innovation and have contributed to the advancement of photomask technology.
Conclusion
Morio Terakado's contributions to the field of photomask technology are significant and impactful. His innovative patent for attaching pellicles to photomasks demonstrates his commitment to enhancing semiconductor manufacturing processes. His work continues to influence the industry and pave the way for future advancements.