Company Filing History:
Years Active: 2011
Title: Monilca Oswald: Innovator in Plasma-Sprayed Technology
Introduction
Monilca Oswald is a notable inventor based in Hanau, Germany. He has made significant contributions to the field of materials science, particularly in the development of plasma-sprayed layers of aluminum oxide. His innovative work has led to advancements in various applications, showcasing his expertise and dedication to the field.
Latest Patents
Monilca Oswald holds 1 patent for his invention titled "Plasma-sprayed layers of aluminum oxide." This patent describes a method for producing plasma-sprayed layers of aluminum oxide on a substrate using pyrogenically produced aluminum oxide. The starting powder can be selected from a group consisting of borosilicate and steel, which enhances the versatility and effectiveness of the coating process.
Career Highlights
Oswald is currently employed at Evonik Degussa GmbH, a leading company in specialty chemicals. His role at the company allows him to apply his innovative ideas and contribute to cutting-edge research and development in materials technology. His work has positioned him as a key player in the industry, driving advancements that benefit various sectors.
Collaborations
Throughout his career, Monilca has collaborated with talented coworkers, including Yi Deng and Klaus Deller. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of innovative solutions in their field.
Conclusion
Monilca Oswald's contributions to the field of plasma-sprayed technology exemplify his commitment to innovation and excellence. His work continues to influence advancements in materials science, making a lasting impact on the industry.