Company Filing History:
Years Active: 2014
Title: Monali B Joshi: Innovator in Semiconductor Technology
Introduction
Monali B Joshi is a prominent inventor based in San Francisco, California. She has made significant contributions to the field of semiconductor technology, particularly in the development of composite semiconductor substrates.
Latest Patents
Monali holds a patent for "Composite semiconductor substrates for thin-film device layer transfer." This patent describes composite semiconductor substrates designed for use in semiconductor device fabrication and related devices and methods. In one embodiment, the composite substrate includes a bulk silicon layer, a porous silicon layer adjacent to the bulk silicon layer with a Young's modulus value no greater than 110.5 GPa, an epitaxial template layer with a root-mean-square surface roughness value ranging from 0.2 nm to 1 nm, and a set of silicon nitride layers positioned between the porous silicon layer and the epitaxial template layer.
Career Highlights
Monali is affiliated with the University of California, where she continues to advance her research and innovation in semiconductor technologies. Her work has garnered attention for its potential applications in various electronic devices.
Collaborations
Monali collaborates with Mark Goorsky, a fellow researcher, to further explore advancements in semiconductor materials and their applications.
Conclusion
Monali B Joshi's innovative work in semiconductor technology exemplifies the impact of research and development in advancing electronic materials. Her contributions are paving the way for future innovations in the field.