Location History:
- Bali, TW (2006)
- Bali-Township, Taipei County, TW (2007)
Company Filing History:
Years Active: 2006-2007
Title: Mon-Haw Chang: Innovator in Photosensitive Compositions
Introduction
Mon-Haw Chang is a notable inventor based in Bali, Indonesia. He has made significant contributions to the field of photosensitive compositions, holding a total of 2 patents. His work focuses on developing innovative materials that enhance the functionality and application of photosensitive technologies.
Latest Patents
Chang's latest patents include a photosensitive composition and a color paste designed for creating the photosensitive composition. The photosensitive resin composition consists of a photosensitive resin system, a pigment, a photo-reactive amphipathic molecule, and a solvent. Additionally, the color paste comprises the pigment and the photo-reactive amphipathic molecule. Another patent involves an alkali-soluble resin with a polyaromatic group, which includes a photosensitive composition that utilizes this resin. The alkali-soluble resin features recurring units that may contain various substituents, enhancing its versatility in applications.
Career Highlights
Mon-Haw Chang is affiliated with the Industrial Technology Research Institute, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its potential applications in various industries, particularly in the development of advanced materials.
Collaborations
Chang collaborates with esteemed colleagues such as Kuo-Tung Huang and Shi-Deh Chao. Their combined expertise contributes to the advancement of research and development in photosensitive technologies.
Conclusion
Mon-Haw Chang's contributions to the field of photosensitive compositions highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to enhancing material properties and expanding their applications.