Miwako Ando

Title: Miwako Ando: Innovator in Exposure Apparatus Technology

Introduction

Miwako Ando is a prominent inventor based in Utsunomiya, Japan. She has made significant contributions to the field of exposure apparatus technology, holding a total of 2 patents. Her work focuses on enhancing the precision and efficiency of device manufacturing methods.

Latest Patents

Miwako Ando's latest patents include innovative designs for exposure apparatuses. One patent describes an exposure apparatus that features a measurement system capable of performing exposure control measurement using a first mark on an original stage and a second mark on a substrate stage. This apparatus allows for the adjustment of illumination conditions during the measurement process. Another patent outlines an exposure apparatus equipped with a projection optical system designed to project a pattern from an original onto a substrate. This design includes an interferometer for measuring wavefronts in two directions and a focus detecting unit to identify focus positions, ultimately calculating wavefront aberration for improved accuracy.

Career Highlights

Miwako Ando is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. Her role involves developing advanced technologies that contribute to the company's innovative product lineup.

Collaborations

Miwako collaborates with her coworker, Yoshinori Ohsaki, who is also a talented inventor in the field. Together, they work on projects that push the boundaries of exposure technology.

Conclusion

Miwako Ando's contributions to exposure apparatus technology demonstrate her commitment to innovation and excellence. Her patents reflect her expertise and the impact of her work in the industry.