Yokohama, Japan

Miwa Tanaka


Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Miwa Tanaka - Pioneer in Semiconductor Innovations

Introduction

Miwa Tanaka is an accomplished inventor based in Yokohama, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of two patents that enhance the functionality and efficiency of electronic devices.

Latest Patents

Tanaka's expertise is reflected in her latest patents, which include groundbreaking inventions such as the "Anneal Technique for Reducing Amount of Electronic Trap in Gate Oxide Film of Transistor" and "Insulating Film for Use in Semiconductor Device." These innovations demonstrate her commitment to advancing semiconductor technology and addressing critical challenges in the industry.

Career Highlights

Miwa Tanaka is currently employed at Kabushiki Kaisha Toshiba, a leading Japanese multinational conglomerate. Her work at Toshiba emphasizes her role as a key contributor to the development of innovative solutions in the semiconductor sector. Through her tenure, she has played a vital role in pushing the boundaries of technology.

Collaborations

Throughout her career, Tanaka has worked alongside esteemed professionals such as Masahisa Sonoda and Susumu Shuto. These collaborations have facilitated the exchange of ideas and expertise, resulting in advancements that benefit the tech community and beyond.

Conclusion

Miwa Tanaka's contributions to the semiconductor industry exemplify the spirit of innovation. With her notable patents and collaborative work at Toshiba, she continues to shape the future of technology, inspiring current and future inventors in the field.

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