Yokohama, Japan

Mituru Tashiro


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Mituru Tashiro: Innovator in Photosensitive Resin Technology

Introduction

Mituru Tashiro is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of photosensitive resin films. His innovative work has led to advancements that enhance the quality and efficiency of imaging processes.

Latest Patents

Mituru Tashiro holds a patent for a laminate of monolayer film of cyclized butadiene polymer. This photosensitive resin film consists of a monolayer film made from a composition that includes a cyclized product of butadiene polymer, a photo-crosslinking agent, a photo-sensitizer, and a storage stabilizer. The film can be intimately contacted with a negative film, allowing for the creation of sharp images when exposed to light. Additionally, the film exhibits excellent heat resistance after development.

Career Highlights

Tashiro is associated with Japan Synthetic Rubber Co., Ltd., where he has been instrumental in advancing polymer technology. His work has not only contributed to the company's reputation but has also pushed the boundaries of what is possible in the field of photosensitive materials.

Collaborations

Some of his notable coworkers include Yoshiyuki Harita and Kunihiro Harada. Their collaborative efforts have further enhanced the innovative capabilities within their projects.

Conclusion

Mituru Tashiro's contributions to the field of photosensitive resin technology exemplify the impact of innovation in polymer science. His work continues to influence advancements in imaging technology and materials science.

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