Suwon-si, South Korea

Mitsuru Oikawa



Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Suwon-si, KR (2012 - 2015)
  • Seongnam-si, KR (2018)
  • Seongnam, KR (2018)
  • Suwon, KR (2021)
  • Gyeonggi-do, KR (2022)

Company Filing History:


Years Active: 2012-2022

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10 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Mitsuru Oikawa

Introduction

Mitsuru Oikawa is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of developing devices, holding a total of 10 patents. His work focuses on enhancing the efficiency and functionality of developing devices used in various applications.

Latest Patents

One of Oikawa's latest patents involves the development of a device with an elastic film designed to block air input. This innovative device includes a housing that contains a developer and features an opening. A developing sleeve is provided within the housing, partially exposed to the outside through the opening. It also incorporates a magnetic member with multiple magnetic poles located inside the developing sleeve. An elastic member is strategically placed to block air inflow through a space between the downstream edge of the opening and the outer circumferential surface of the developing sleeve. The elastic member consists of a fixed portion attached to the housing and an extension portion that elastically contacts the surface of the developing sleeve.

Another notable patent focuses on a developing device structured to prevent toner scattering using magnetic repulsive force. This device includes a developing sleeve installed in a developing chamber, which is partially exposed through an opening. A magnetic member is located inside the developing sleeve, featuring a separating pole and a receiving pole. The separating pole is positioned downstream of the opening to separate the developing agent from the sleeve, while the receiving pole attaches the developing agent back to the sleeve. A magnet is placed between the inner wall of the developing chamber and the magnetic member, ensuring the same magnetic polarity as the separating and receiving poles.

Career Highlights

Mitsuru Oikawa has worked with notable companies such as Samsung Electronics Co., Ltd. and Hewlett-Packard Development Company, L.P. His experience in these leading organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Oikawa has collaborated with talented individuals in his field, including Jong-Hyun Park and Jun-hee Lee. These partnerships have fostered a creative environment that has led to the development of groundbreaking inventions.

Conclusion

Mitsuru Oikawa's contributions to the field of developing devices are noteworthy and reflect his innovative spirit. His patents demonstrate a commitment to improving technology and enhancing user experience. Oikawa's work continues to influence the industry and inspire future innovations.

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