Mitsuru Ikeda

Title: Mitsuru Ikeda: Innovator in Solid-State Imaging Technology

Introduction

Mitsuru Ikeda is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of solid-state imaging devices, holding a total of 6 patents. His work has paved the way for advancements in imaging technology, particularly in enhancing the quality and resolution of images.

Latest Patents

Ikeda's latest patents include a solid-state imaging device that features a transparent electrode, a photoconductive layer, and multiple scanning circuits. This innovative design allows for the consecutive selection of signals in the photoconductive layer. The photoconductive layer is composed of an amorphous semiconductor, primarily amorphous silicon, which includes elements that lower the capture level within the energy gap and a trace amount of chalcogen as a chemical modifier. Another notable patent is a process for fabricating a solid-state imaging device that achieves high resolution with minimal color mixing. This process involves forming a photoconductive film in layers on a semiconductor substrate, ensuring that adjacent pixels are spatially isolated through precise etching techniques.

Career Highlights

Throughout his career, Mitsuru Ikeda has worked with notable companies such as Fuji Photo Film Company, Limited and Kabushiki Kaisha Daini Seikosha. His experience in these organizations has contributed to his expertise in imaging technology and innovation.

Collaborations

Ikeda has collaborated with esteemed colleagues, including Akio Higashi and Haruji Shinada. Their combined efforts have further advanced the field of solid-state imaging.

Conclusion

Mitsuru Ikeda's contributions to solid-state imaging technology have been instrumental in shaping the industry. His innovative patents and collaborations reflect his dedication to advancing imaging solutions. His work continues to influence the development of high-resolution imaging devices.