Company Filing History:
Years Active: 2017-2023
Title: Mitsumasa Ikeuchi: Innovator in Silicon Substrate Analysis
Introduction
Mitsumasa Ikeuchi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of silicon substrate analysis, holding three patents that showcase his innovative approaches. His work focuses on enhancing the accuracy and efficiency of analyzing silicon substrates, which are crucial in various technological applications.
Latest Patents
One of his latest patents is a method for analyzing silicon substrates. This invention provides a high-accuracy method for detecting impurities, such as trace metals, in silicon substrates that are covered with a thick nitride film. The method utilizes an advanced silicon substrate analysis apparatus that includes an analysis scan port, a substrate conveyance robot, an aligner, a drying chamber, a vapor phase decomposition chamber, an analysis stage, and a nozzle for substrate analysis. Additionally, it features an analysis liquid collection unit and an analyzer for performing inductive coupling plasma analysis.
Another notable patent is an analysis system for online-transferred analysis samples. This system allows for the online transfer of analysis samples and enables prompt acquisition of analysis results. It is designed to analyze samples supplied from multiple sites using a single analysis apparatus, eliminating the need for cleaning processes for the nebulizer and spray chamber. The system includes at least two sample individually transferring units, each with a main flow path, a makeup gas supply path, and a drain flow path, all connected to a common analysis unit.
Career Highlights
Mitsumasa Ikeuchi has worked with notable companies such as Ias, Inc. and Kioxia Corporation. His experience in these organizations has contributed to his expertise in the field of silicon substrate analysis and has allowed him to develop innovative solutions that address industry challenges.
Collaborations
Throughout his career, Mitsumasa has collaborated with talented individuals, including Katsuhiko Kawabata and Sungjae Lee. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Mitsumasa Ikeuchi is a distinguished inventor whose work in silicon substrate analysis has made a significant impact on the industry. His innovative patents and collaborations highlight his commitment to advancing technology and improving analytical methods.