Miri Park

Title: Miri Park: Innovator in Nanoscale Patterning

Introduction

Miri Park is a prominent inventor based in Lawrenceville, NJ (US). She has made significant contributions to the field of nanoscale patterning, showcasing her expertise through her innovative patent.

Latest Patents

Miri Park holds a patent titled "Method of nanoscale patterning and products made thereby." This patent describes methods for nanometer pattern formation and transfer onto a selected substrate. The process involves coating a selected block copolymer onto the substrate and modifying or removing a component of the block copolymer. This allows for the dense periodic pattern of the block copolymer to be effectively transferred onto the substrate. The substrates prepared by these methods are also included in her patent.

Career Highlights

Throughout her career, Miri Park has demonstrated a commitment to advancing technology in her field. Her work has not only contributed to scientific knowledge but has also paved the way for practical applications in various industries.

Collaborations

Miri has collaborated with notable colleagues, including Christopher Harrison and Richard A Register. These partnerships have further enhanced her research and development efforts.

Conclusion

Miri Park is a trailblazer in the realm of nanoscale patterning, with her innovative patent reflecting her dedication to advancing technology. Her contributions continue to influence the field and inspire future innovations.