Company Filing History:
Years Active: 2008
Title: Minoru Yamagiwa: Innovator in Mask Pattern Technology
Introduction
Minoru Yamagiwa is a notable inventor based in Takatsuki, Japan. He has made significant contributions to the field of mask pattern technology, particularly in the area of mask pattern correction techniques. His innovative approach has streamlined processes in the semiconductor manufacturing industry.
Latest Patents
Yamagiwa holds a patent for a "Mask pattern generating method and mask pattern generating apparatus." This invention establishes a mask pattern correcting technique aimed at reducing the load on mask CAD processes while ensuring the minimum dimension defined in an Optical Proximity Correction (OPC) process. The method involves measuring the line width of a mask pattern, extracting edges where the line width is smaller than a predetermined dimension, and generating a central geometrical object with a predetermined width. This central geometrical object replaces the portion of the mask pattern that does not meet the required dimensions, effectively changing the mask pattern line width to the desired specifications. This innovation notably reduces the number of geometrical object calculating steps, thereby shortening the mask CAD processing time.
Career Highlights
Minoru Yamagiwa is associated with Matsushita Electric Industrial Co., Ltd., where he has applied his expertise in mask pattern technology. His work has been instrumental in enhancing the efficiency of semiconductor manufacturing processes.
Collaborations
Yamagiwa has collaborated with notable colleagues such as Tadashi Tanimoto and Akio Misaka. Their combined efforts have contributed to advancements in the field of mask pattern technology.
Conclusion
Minoru Yamagiwa's contributions to mask pattern technology exemplify the impact of innovative thinking in the semiconductor industry. His patent not only addresses critical challenges but also enhances the efficiency of manufacturing processes.