Sunnyvale, CA, United States of America

Mingwei Jiang


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 1999-2002

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3 patents (USPTO):Explore Patents

Title: Innovations of Mingwei Jiang

Introduction

Mingwei Jiang is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of plasma sputtering systems, holding a total of three patents. His work focuses on advanced technologies that enhance the deposition of films on various substrates.

Latest Patents

One of his latest patents is the "Horizontal Sputtering System." This invention describes a plasma sputtering system designed to deposit films on substrates, such as optical disks. The system features a main vacuum chamber connected to multiple sputtering chambers and a load lock chamber. It utilizes a substrate transport tray that supports the substrate and masks throughout the processing stages. The system includes a vertical lift and a carousel for efficient transport and processing of the substrate.

Another significant patent is the "Magnetic Array for Sputtering System." This invention outlines a plasma sputtering system that incorporates an array of magnets within a vacuum chamber. The system includes a rotating magnetron and a target positioned to deposit material onto a substrate. The design features pairs of oppositely poled permanent magnets, creating a closed-loop magnetic path that enhances the sputtering process.

Career Highlights

Mingwei Jiang has worked with prominent companies in the semiconductor industry, including Steag Hamatech AG and Novellus Systems Incorporated. His experience in these organizations has contributed to his expertise in developing innovative sputtering technologies.

Collaborations

Throughout his career, Mingwei has collaborated with notable professionals, including Ken Lee and Larry D. Hartsough. These collaborations have likely enriched his work and led to advancements in his inventions.

Conclusion

Mingwei Jiang's contributions to the field of plasma sputtering systems demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in film deposition processes.

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