Ming Xi Chan

Title: Innovations by Ming Xi Chan in Chemical Vapor Deposition

Introduction

Ming Xi Chan is an accomplished inventor based in Milpitas, CA, known for her significant contributions to the field of electronic device manufacturing. With a total of two patents to her name, she has focused her work on improving processes that enhance the efficiency and quality of electronic devices.

Latest Patents

One of her latest patents is titled "Chamber for Reducing Contamination During Chemical Vapor Deposition." This invention pertains to the design of apparatus for processing electronic devices, specifically equipment used in chemical vapor deposition. The innovative designs of gas separator plates, along with their configuration and the regulation of gas flows, provide control over the pattern of precursor gas flow away from the separation plates. This advancement decreases the amount of byproducts deposited on the plates and throughout the reactor. Additionally, new designs for shaping other surfaces of the dispersion head reduce contamination of those elements. The chamber panels are also redesigned to decrease the deposition of byproducts on various surfaces, which enhances the overall efficiency of the reactor. By decreasing the deposition of byproducts, the amount and quality of thin films that can be deposited without requiring system shutdown for cleaning are significantly improved. This innovation ultimately increases the throughput of products in the deposition process, thereby enhancing the efficiency of electronic device manufacture and lowering production costs.

Career Highlights

Ming Xi Chan is currently employed at Quester Technology, Inc., where she continues to develop innovative solutions in the field of electronic device manufacturing. Her work has been instrumental in advancing the technology used in chemical vapor deposition processes.

Collaborations

Ming has collaborated with notable colleagues, including David Leksell and Joseph P Ellul, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Ming Xi Chan's contributions to the field of chemical vapor deposition exemplify her commitment to enhancing electronic device manufacturing processes. Her innovative patents not only improve efficiency but also reduce costs, making a significant impact in the industry.