Company Filing History:
Years Active: 2015-2018
Title: The Innovations of Ming Liu
Introduction
Ming Liu is a notable inventor based in Singapore, SG. He has made significant contributions to the field of exhaust gas treatment, holding 2 patents that showcase his innovative approaches. His work focuses on developing systems and methods that enhance environmental sustainability.
Latest Patents
Ming Liu's latest patents include an "Apparatus and method for treatment of exhaust gas." This invention relates to a process for removing pollutants from exhaust gas through a wet scrubbing method. In this scrubber apparatus, exhaust gas is initially scrubbed in a primary mixing zone. The partially scrubbed gas is then forcibly mixed in a secondary mixing zone before being discharged for polishing, demisting, and/or reheating. Another significant patent is titled "Systems and methods for exhaust gas cleaning and/or ballast water treatment." This invention addresses the efficient removal of sulfur oxides (SOx), nitrogen oxides (NOx), and particulate matter (PM) from exhaust gas generated by fuel combustion, as well as the treatment of water containing microorganisms, such as ballast water.
Career Highlights
Ming Liu is currently associated with Keppel Offshore & Marine Technology Centre Pte Ltd. His role at this esteemed organization allows him to further his research and development efforts in environmental technologies. His work is crucial in addressing the challenges posed by industrial emissions and water treatment.
Collaborations
Ming Liu collaborates with talented individuals such as Nirmal Raman Gurunthalingam and Kok Seng Foo. These partnerships enhance the innovative capacity of their projects and contribute to the advancement of their shared goals.
Conclusion
Ming Liu's contributions to exhaust gas treatment and environmental sustainability are commendable. His patents reflect a commitment to innovation and a proactive approach to addressing environmental challenges. His work continues to inspire advancements in the field.