Company Filing History:
Years Active: 2025
Title: Innovations by Ming Hong Yang in Plasma Ion Source Technology
Introduction
Ming Hong Yang is an accomplished inventor based in Campbell, California. He has made significant contributions to the field of mass spectrometry through his innovative patent. His work focuses on enhancing metrology processes using advanced plasma ion source technology.
Latest Patents
Ming Hong Yang holds a patent for a "Multiple plasma ion source for inline secondary ion mass spectrometry." This invention leverages premixed gas mixtures to perform a metrology process on a substrate using an inline secondary ion mass spectrometry (SIMS) process. The method involves injecting a premixed gas mixture of two or more gases into a plasma chamber configured to produce sputtering ions. These gases generate non-metallic ion species that are compatible with downstream substrate fabrication processes, allowing further fabrication to be performed after the inline SIMS process. The sputtering ions are ejected from the plasma chamber into a magnetic field, where the intensity is altered to select a single species of ions. This selected species is directed towards the substrate surface, and the secondary ions sputtered from the surface are detected and analyzed.
Career Highlights
Ming Hong Yang is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to develop and refine his innovative technologies, contributing to advancements in the industry.
Collaborations
Ming has collaborated with notable colleagues, including Dimitry Kouzminov and Arun Ramaswamy Srivatsa. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Ming Hong Yang's contributions to plasma ion source technology exemplify the innovative spirit of modern inventors. His patent not only enhances the capabilities of mass spectrometry but also paves the way for future advancements in substrate fabrication processes.