Kaohsiung, Taiwan

Ming-Chu Wu


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ming-Chu Wu

Introduction

Ming-Chu Wu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of electrophotographic processes. His innovative work has led to the development of a unique charging component that enhances the efficiency of these processes.

Latest Patents

Ming-Chu Wu holds a patent for a charging component designed for use in electrophotographic processes. This component features a protective surface layer made from a polyether-ester-amide block copolymer. The copolymer is environmentally stable, exhibiting a volume resistivity between 106 Ohm-cm and 1012 Ohm-cm, along with a Shore hardness ranging from Shore D 5 to Shore D 90. During the electrophotographic process, an external voltage is applied to the charging component, allowing a photo-conductive drum to become electrostatically charged. The preferred embodiment of the voltage consists of a direct voltage of ±200 to ±2,000 V, overlapped with an alternating voltage that has a peak-to-peak voltage of 4,000 V.

Career Highlights

Ming-Chu Wu is associated with the Industrial Technology Research Institute, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the field of electrophotography, making processes more efficient and environmentally friendly.

Collaborations

Ming-Chu Wu has collaborated with notable colleagues, including Der-Tarng Su and Wen-Jer Chen. Their combined expertise has contributed to the success of various projects within the Industrial Technology Research Institute.

Conclusion

Ming-Chu Wu's contributions to the field of electrophotographic processes through his innovative patent demonstrate his commitment to advancing technology. His work not only enhances efficiency but also emphasizes environmental stability in industrial applications.

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