This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: The Innovative Contributions of Mineo Goto
Introduction
Mineo Goto is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in photomask technology.
Latest Patents
Mineo Goto holds a patent for a method of forming a photomask and a method of manufacturing a semiconductor device. This patent describes a process where resist film patterns are formed on a light shielding film on a glass substrate. The resist film patterns cover specific regions of the substrate's surface. Using these patterns as a mask, the light shielding film is then patterned to create a light shielding film pattern. An important feature of this method is the use of a dummy pattern in the process.
Career Highlights
Mineo Goto is associated with Kabushiki Kaisha Toshiba, a leading company in technology and electronics. His work has contributed to the company's reputation for innovation in semiconductor technology.
Collaborations
Mineo Goto has collaborated with notable coworkers such as Shigeru Hasebe and Osamu Ikenaga. Their combined expertise has further enhanced the development of advanced technologies in their field.
Conclusion
Mineo Goto's contributions to semiconductor manufacturing and photomask technology highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile