Company Filing History:
Years Active: 1999
Title: Min-Huei Lin: Innovator in Ion Implantation Technology
Introduction
Min-Huei Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of ion implantation technology. His innovative designs have the potential to enhance the efficiency and effectiveness of ion implanters.
Latest Patents
Min-Huei Lin holds a patent for an "Arc chamber for ion implanter." This invention includes a reaction chamber, a filament element for generating electrons, and multiple power supply means to optimize ionization efficiency. The design features gas injection openings that allow suitable gas to be ionized in a gaseous plasma by electron impact. The patent also details the use of filament insulators for isolation, ensuring the proper functioning of the ion implanter.
Career Highlights
Min-Huei Lin is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing ion implantation processes, which are critical in the manufacturing of semiconductor devices.
Collaborations
Min-Huei Lin has collaborated with several talented individuals, including Pei-Wei Tsai and Tzu-Hsin Huang. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Min-Huei Lin's contributions to ion implantation technology exemplify the spirit of innovation. His patent and ongoing work at Mosel Vitelic Corporation highlight his commitment to advancing the field.