Moskovskaya oblast, Russia

Michail Yurjevich Kornienko


 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Michail Yurjevich Kornienko: Innovator in Corrosion-Resistant Coatings

Introduction

Michail Yurjevich Kornienko is a notable inventor based in Moskovskaya oblast, Russia. He has made significant contributions to the field of materials science, particularly in the development of advanced coating technologies. His innovative approach has led to the creation of a unique method for applying corrosion-resistant film coatings on zirconium alloys.

Latest Patents

Kornienko holds a patent for a method of ion-plasma application of corrosion-resistant film coatings on articles made from zirconium alloys. This method involves placing articles in a planetary carousel mechanism, heating them, and utilizing ion-beam etching and surface activation. The process employs water-cooled unbalanced magnetrons and an ion source that generates gas ions with an accelerating voltage of up to 5000 V. The coating is applied using both unbalanced and balanced magnetrons, ensuring uniform thickness and enhanced productivity.

Career Highlights

Kornienko is associated with Joint-Stock Company Tvel, where he has been instrumental in advancing coating technologies. His work has not only improved the durability of zirconium alloy articles but has also increased the efficiency of the coating process. His innovative methods have garnered attention in the field and have the potential to impact various industrial applications.

Collaborations

Kornienko has collaborated with notable colleagues, including Vladislav Konstantinovich Orlov and Alexander Olegovich Titov. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Michail Yurjevich Kornienko's contributions to the field of corrosion-resistant coatings exemplify the importance of innovation in materials science. His patented methods and collaborative efforts continue to pave the way for advancements in this critical area of technology.

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