Michael W Stowell

Title: Michael W Stowell: Innovator in Sputter Deposition Technology

Introduction

Michael W Stowell is a notable inventor based in Loveland, Colorado. He has made significant contributions to the field of sputter deposition technology. His innovative approach has led to advancements that enhance the quality and efficiency of film deposition processes.

Latest Patents

Stowell holds a patent for a "System and apparatus for control of sputter deposition process." This invention involves a method and apparatus that utilizes both a pulsed DC power supply and an RF power supply to apply power to the target in sputter deposition equipment. The pulsed DC power supply operates in an on cycle, where power is applied to the target, and an off cycle, where reverse polarity is applied. This reverse polarity effectively removes any charge that may accumulate on the target's surface, reducing the likelihood of arcing that can degrade film quality. By applying RF power simultaneously with the pulsed DC power, the ionization efficiency on the target surface is increased, allowing for a greater amount of material to be removed more quickly.

Career Highlights

Stowell is currently associated with Applied Films Corporation, where he continues to develop and refine technologies related to sputter deposition. His work has been instrumental in advancing the capabilities of the company's offerings in the semiconductor and thin film industries.

Collaborations

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Conclusion

Michael W Stowell's contributions to sputter deposition technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving manufacturing processes and enhancing product quality.