Morris Plains, NJ, United States of America

Michael S Cochran



Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Michael S. Cochran: Innovator in Chlorine Dioxide Technology

Introduction

Michael S. Cochran is a notable inventor based in Morris Plains, NJ (US). He has made significant contributions to the field of chemical engineering, particularly in the development of composite materials that release chlorine dioxide.

Latest Patents

Cochran holds a patent for a "Chlorine dioxide releasing composite article." This innovative composite article integrates a ClO-producing material into an organic matrix. The organic matrix is designed to be formable at temperatures below about 150°C. It allows for contact between an activating stimulus, such as water vapor or electromagnetic energy, and the ClO-producing material when exposed to the activating stimulus. Additionally, the matrix is permeable to chlorine dioxide, enhancing its effectiveness.

Career Highlights

Throughout his career, Cochran has worked with prominent companies, including BASF Corporation and BASF Catalysts LLC. His experience in these organizations has contributed to his expertise in developing advanced chemical products.

Collaborations

Cochran has collaborated with several professionals in his field, including Barry Keven Speronello and Linda Hratko. These collaborations have likely enriched his work and led to further innovations.

Conclusion

Michael S. Cochran's contributions to chlorine dioxide technology exemplify his innovative spirit and dedication to advancing chemical engineering. His patent and career achievements reflect his significant impact on the industry.

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