Location History:
- Dayton, OH (US) (1978)
- Oceanside, CA (US) (1982)
- Freemont, CA (US) (1989)
Company Filing History:
Years Active: 1978-1989
Title: Michael R. Gulett: Innovator in Photoresist Technology
Introduction
Michael R. Gulett is a notable inventor based in Dayton, OH (US), recognized for his contributions to the field of photoresist technology. With a total of 3 patents, Gulett has made significant advancements that enhance the performance and application of photoresist materials in various industrial processes.
Latest Patents
Gulett's latest patents include a "Multiple photoresist layer process using selective hardening." This innovative process selectively hardens a surface layer of polymeric photoresist, making it opaque and insoluble in photoresist carrier solvents. The method employs controlled exposure to gas plasmas, ion bombardment, or ultraviolet radiation to create a barrier that protects the polymeric regions from solvents and developers. This process can be utilized in a two-layer photoresist structure, allowing for efficient development and preventing depolymerization during exposure.
Another significant patent is the "Method for conditioning nitride surface." This method involves treating a nitride surface with ionized oxygen in a vacuum to improve adhesion characteristics for subsequent processing steps. The treatment is performed at ambient temperature and is crucial for enhancing the performance of photoresist films applied to silicon nitride surfaces.
Career Highlights
Michael R. Gulett is currently employed at NCR Corporation, where he continues to innovate and develop new technologies in the field of photoresist applications. His work has contributed to advancements in manufacturing processes, particularly in the semiconductor industry.
Collaborations
Gulett has collaborated with notable colleagues, including Murray L. Trudel and John K. Stewart, Jr. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Michael R. Gulett's contributions to photoresist technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of material science and its applications in modern technology.