Company Filing History:
Years Active: 2018
Title: The Innovative Contributions of Michael Ng
Introduction
Michael Ng, an accomplished inventor based in Dublin, California, has made significant strides in the field of materials science and engineering. With a focus on improving the fabrication processes for advanced memory technologies, Ng's contributions are both innovative and practical.
Latest Patents
Ng holds a patent for a unique method of depositing low-stress nitrogen-doped tungsten films through physical vapor deposition (PVD). This innovation allows for the creation of films characterized by low stress levels—specifically less than 250 MPa—and excellent adhesion to dielectric layers. These nitrogen-doped tungsten films are particularly beneficial in the fabrication of 3D memory stacks, as they ensure reliability and performance in electronic applications. The films possess a higher concentration of nitrogen at the interface with the dielectric layer, enhancing their properties and functionality.
Career Highlights
Michael Ng is part of Lam Research Corporation, a leader in providing systems and services for the semiconductor industry. His work focuses on developing advanced deposition techniques that are crucial for manufacturing next-generation semiconductor devices. Ng's innovative approach not only contributes to the company’s technological advances but also positions Lam Research Corporation at the forefront of semiconductor materials research.
Collaborations
Working alongside Michael Rumer, Ng has engaged in collaborative efforts that combine their expertise in materials and deposition techniques. This partnership has allowed them to explore new avenues in the development of semiconductor technologies, further enhancing their contributions to the field.
Conclusion
Michael Ng's work exemplifies the impact of innovation in the semiconductor industry. With his patent for low-stress nitrogen-doped tungsten films, he has opened up new possibilities for the fabrication of 3D memory stacks. As an inventor, his contributions not only advance technological capabilities but also reflect the ongoing evolution in materials science, driven by talented individuals like him.