Company Filing History:
Years Active: 2006
Title: Michael Kwok Leung Ng: Innovator in PVD Deposition Processes
Introduction
Michael Kwok Leung Ng is a notable inventor based in Daly City, CA, who has made significant contributions to the field of physical vapor deposition (PVD) processes. His innovative approach focuses on enhancing the properties of metal films, particularly through the use of hydrogen in the sputtering process.
Latest Patents
Ng holds a patent for a unique physical vapor deposition sputtering process that improves the preferred orientation of titanium layers. This method not only enhances the structural properties but also leads to the formation of aluminum layers with a predominant <111> crystallographic orientation. Such advancements are crucial in providing enhanced resistance to electromigration, which is essential in microelectronics.
Career Highlights
Currently, Michael is employed at Novellus Systems Incorporated, where he continues to work on developing advanced materials and processes. His innovative spirit has led to advancements in the manufacturing of metallization layers, proving essential in the semiconductor industry.
Collaborations
Ng collaborates with esteemed colleagues such as Michael Rumer and Jack Griswold, contributing to a dynamic environment that fosters innovation and technological advancement within their field. Their combined expertise strengthens their research and development efforts at Novellus Systems.
Conclusion
Michael Kwok Leung Ng stands out as an inventor with a noteworthy patent that enhances metal film properties through novel PVD techniques. His contributions not only reflect his expertise but also significantly impact the performance of electronic components in the industry. As he continues to innovate, he remains a key figure in advancing metallization processes.