München, Germany

Michael Heissmeier


Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2003-2004

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3 patents (USPTO):

Title: The Innovative Contributions of Michael Heissmeier

Introduction

Michael Heissmeier, an accomplished inventor based in München, Germany, is known for his significant contributions to the field of photolithography. With three patents to his name, Heissmeier has developed innovative solutions that address complex challenges in the production of photonic devices.

Latest Patents

His latest patents reflect his expertise in resolving phase conflicts in alternating phase masks. One notable patent describes a method for determining and removing phase conflicts on alternating phase masks. In this method, a photoresist layer on a substrate wafer is exposed in distinct sections with phase-shifted radiation. This innovative process is crucial in ensuring the accurate exposure of the photoresist layer, particularly in boundary regions where exposure is artificially inadequate. Another important patent focuses on an alternating phase mask design that effectively avoids phase conflicts in T pattern structures by incorporating a phase jump at strategic corners, showcasing Heissmeier's ability to merge creativity with technical precision.

Career Highlights

Heissmeier is employed at Infineon Technologies AG, a leading company in semiconductor solutions. Throughout his career, he has focused on advancing photolithographic techniques that enhance the efficiency and quality of electronic components, making a tangible impact in the tech industry. His patents not only demonstrate technical ingenuity but also the potential for practical applications within semiconductor manufacturing.

Collaborations

Collaboration is a key facet of Heissmeier's work, as evidenced by his partnership with esteemed colleagues Burkhard Ludwig and Molela Moukara. Together, they contribute to innovative projects within their company, pushing the boundaries of what is achievable in photolithography and semiconductor technology.

Conclusion

Michael Heissmeier's contributions to the field of photolithography are commendable and reflect his dedication to innovation. His patents serve as a testament to his inventive spirit and collaborative nature, positioning him as a significant figure in the ongoing evolution of semiconductor technology. As he continues to develop and refine these methods and technologies, the impact of his work is likely to resonate throughout the industry for years to come.

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